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专利名称：Method of treating fluorine compound and
treated substance
发明人：Kiyoshi Fuda,Toshiaki Matsunaga,Takeshi
Kamiya,Kota Omori
申请号：US10809354申请日：20040326
公开号：US20050004410A1公开日：20050106
摘要：Divalent and trivalent metal salts are added to the solution containing thefluorine compound to precipitate the layered double hydroxide containing the fluorinecompound between layers. By these processes, the fluorine compound can be fixed withhigh rate. Moreover, if necessary, the precipitated layered double hydroxide can berecovered to separate the fluorine compound or its salt between layers. Therefore, theburden to environment or the ecosystem by the fluorine compound can be reduced.
申请人：Kiyoshi Fuda,Toshiaki Matsunaga,Takeshi Kamiya,Kota Omori
地址：Akita JP,Akita JP,Akita JP,Akita JP
国籍：JP,JP,JP,JP
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