专利内容由知识产权出版社提供
专利名称：Plasma-processing apparatus发明人：Yukito Aota,Masahiro Kanai,Atsushi
Koike,Tomokazu Sushihara
申请号：US10745604申请日：20031229公开号：US07582185B2公开日：20090901
专利附图：
摘要：A plasma-processing apparatus having a high frequency power applicationelectrode in which plasma is generated by supplying VHF power to the high frequencypower application electrode. The plasma-processing apparatus has an impedance-
matching equipment comprising a capacitive element and an inductive element, which aremutually connected in series. The apparatus is arranged so that the capacitive elementand the inductive element of the impedance-matching equipment are symmetrical withrespect to the center of the high frequency power application electrode.
申请人：Yukito Aota,Masahiro Kanai,Atsushi Koike,Tomokazu Sushihara
地址：Kanagawa JP,Tokyo JP,Kanagawa JP,Chiba JP
国籍：JP,JP,JP,JP
代理机构：Fitzpatrick, Cella, Harper & Scinto
更多信息请下载全文后查看
